Abstract: In order to improve the performance of traditional electron multipliers in the fields of nuclear detection, aerospace, national defense and precision scientific instruments, it can achieve the goals of high gain, good signal-to-noise ratio and long life under lower operating voltage and incident electron energy.This article has carried out a lot of research work on material preparation, secondary electron emission test and performance optimization of electron multipliers. A new thin film material with high secondary electron yield（SEY）is developed by atomic layer deposition (ALD) technology. The methods of element doping and surface modification to improve the secondary electron emission characteristics of the material are studied, and the secondary electron yield of the thin film material are tested in detail.The new thin film materialis successfully applied to the microchannel plate (MCP) and channeltron electron multiplier (CEM) by ALD technology. The test results are as follows: under the same working voltage, the gain, single-electron resolution, the peak-to-valley ratio are improved by about 166%, 17% and 260% respectively; for a single CEM, the gain can only reach 108 when the operating voltage is 2700V before coating, and the same gain can be achieved at 1600V after coating (operating voltage is reduced by 1100V) , and other parameters (resolution ≤ 26%, accumulative output charge≥15.62C) have been improved.The research results in this article are of great significance in the development of new electron multipliers with high gain and long lifetime and their application in the detection of charged particles and energetic photons.